Novel approach to collimated physical vapor deposition-Reference-Cited by-同舟云学术

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Novel approach to collimated physical vapor deposition

Published:1999-07 Issue:4 Volume:17 Page:1941-1945
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kools J. C. S.,Paranjpe A. P.,Heimanson D. H.,Schwartz P. V.,Song K.,Bergner B.,McAllister S.,Van Ysseldyk R. W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581707

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deposition technology for thin film magnetic recording heads reader fabrication;Thin Solid Films;2000-12

2. Enabling Processes and Integration;Silicon Devices and Process Integration

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