Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology-Reference-Cited by-同舟云学术

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Low sheet resistance titanium nitride films by low-temperature plasma-enhanced atomic layer deposition using design of experiments methodology

Published:2014-05 Issue:3 Volume:32 Page:031506
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Burke Micheal,Blake Alan,Povey Ian M.,Schmidt Michael,Petkov Nikolay,Carolan Patrick,Quinn Aidan J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4868215

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments;Journal of Vacuum Science & Technology A;2023-03-06

2. The Effect of Deposition Temperature of TiN Thin Film Deposition Using Thermal Atomic Layer Deposition;Coatings;2023-01-05

3. Downstream Electric Field Effects during Film Deposition with a Radio Frequency Plasma and Observations of Carbon Reduction;Coatings;2022-10-19

4. Synthesis of Hollow Mesoporous TiN Nanostructures as An Efficient Catalyst Support for Methanol Electro-Oxidation;Catalysts;2021-06-23

5. Design of Experiments and Optimization of Laser-Induced Graphene;ACS Omega;2021-06-23

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