Author:
Farrow R. C.,Mkrtchyan M.,Kizilyalli I. C.,Waskiewicz W. K.,Hopkins L. C.,Alakan A.,Gibson G.,Brown P.,Misra S.,Trimble L.
Cited by
2 articles.
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1. Technology of alignment mark in electron beam lithography;7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials for Manufacturing and Testing;2014-08-21
2. Sub-pixel alignment for direct-write electron beam lithography;MICROELECTRON ENG;2004