Topology of conductive clusters in sputtered high-quality VO2 thin films on the brink of percolation threshold during insulator-to-metal and metal-to-insulator transitions-Reference-Cited by-同舟云学术

Topology of conductive clusters in sputtered high-quality VO2 thin films on the brink of percolation threshold during insulator-to-metal and metal-to-insulator transitions

Published:2020-12 Issue:6 Volume:38 Page:063401
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Koughia Cyril¹,Gunes Ozan¹,Zhang Chunzi¹,Wen Shi-Jie²,Wong Rick²,Yang Qiaoqin³,Kasap Safa O.¹^ORCID

Affiliation:

1. Department of Electrical and Computer Engineering, University of Saskatchewan, Saskatoon, Saskatchewan S7N 5A9, Canada

2. Cisco Systems, Inc., 170 West Tasman Drive, San Jose, California 95134

3. Department of Mechanical Engineering, University of Saskatchewan, Saskatoon, Saskatchewan S7N 5A9, Canada

Funder

Natural Sciences and Engineering Research Council of Canada

Silicon Valley Community Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000443

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