Optical projection system for gigabit dynamic random access memories
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Published:1993-11
Issue:6
Volume:11
Page:2675
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
4 articles.
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1. Gap measurement by position-sensitive detectors;Applied Optics;2000-06-01
2. Catalyzed HF Vapor Etching of Silicon Dioxide for Micro‐ and Nanolithographic Masks;Journal of The Electrochemical Society;1995-04-01
3. Characterization of a 193 nm optical lithography system for 0.18 μm and below;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11
4. Quarter-micron lithography with a gapped Markle–Dyson system;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1994-11