Structural analysis of hydrogenated carbon films obtained by reactive direct current magnetron sputtering-Reference-Cited by-同舟云学术

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Structural analysis of hydrogenated carbon films obtained by reactive direct current magnetron sputtering

Published:1996-01 Issue:1 Volume:14 Page:194-196
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Fujimaki Shigehiko,Matsumoto Hiroshi,Kokaku Yuichi,Kitoh Makoto,Tsumita Norikazu

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579917

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tribological behavior of plasma-enhanced CVD a-C:H films. Part I: effect of processing parameters;Tribology International;2004-11

2. Plasma etching of DLC films for microfluidic channels;Microelectronics Journal;2003-05

3. PREPARATION OF ULTRA THIN CARBON OVERCOAT FOR MAGNETIC RECORDING MEDIUM BY HOT FILAMENT PLASMA CVD;International Journal of Modern Physics B;2002-03-20

4. Supermagnetron plasma chemical vapor deposition and qualitative analysis of electrically conductive diamond-like amorphous carbon films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-07

5. New DLC coating method using magnetron plasma in an unbalanced magnetic field;Vacuum;2000-11

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