Early morphological changes on Si(111) surfaces during UHV processing
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Thermal roughening of GaAs surface by unwinding dislocation-induced spiral atomic steps during sublimation;Applied Surface Science;2020-11
2. Impact of boron on the step-free area formation on Si(111) mesa structures;Journal of Applied Physics;2015-12-28
3. Morphology of mesa surfaces on Si(111) prepared by molecular beam epitaxy at temperatures around the (7×7)-“1×1” surface phase transition;Surface Science;2013-12
4. Preparation of large step-free mesas on Si(111) by molecular beam epitaxy;physica status solidi (c);2012-08-27
5. Smoothing of microfabricated silicon features by thermal annealing in reducing or inert atmospheres;Physica Scripta;2010-11-01
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