Supermagnetron plasma chemical vapor deposition and qualitative analysis of electrically conductive diamond-like amorphous carbon films
Author:
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.1349720
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. N2or H2/Isobutane Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous CNxFilms for Application to Elementary Amorphous CNx:H/p-Si Photovoltaic Cell;Japanese Journal of Applied Physics;2013-11-01
2. Supermagnetron plasma CVD of highly effective a-CNx:H electron-transport and hole-blocking films suited to Au/a-CNx:H/p-Si photovoltaic cells;Thin Solid Films;2009-05
3. Influence of plasma heating of wafer substrates on SiO2 deposition rate in a TEOS/O2 high-density plasma CVD system;Vacuum;2004-05
4. Electron collisions with isomers of C4H8and C4H10;Journal of Physics B: Atomic, Molecular and Optical Physics;2004-02-17
5. Physical properties of nitrogen-doped diamond-like amorphous carbon films deposited by supermagnetron plasma chemical vapor deposition;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2002-07
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