Study of a linear surface wave plasma source for tin removal in an extreme ultraviolet source
Author:
Affiliation:
1. Department of Nuclear, Plasma, and Radiological Engineering, Center for Plasma-Material Interactions, University of Illinois at Urbana-Champaign, 216 Talbot Lab, 104 S. Wright St., Urbana, Illinois 61801
Funder
Starfire Industries Inc.
U.S. Department of Energy
Cymer/ASML San Diego
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://avs.scitation.org/doi/am-pdf/10.1116/6.0000200
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Efficient photo-dissociation-induced production of hydrogen radicals using vacuum ultraviolet light from a laser-produced plasma;Applied Physics Letters;2024-01-01
2. Stannane in extreme ultraviolet lithography and vacuum technology: Synthesis and characterization;Journal of Vacuum Science & Technology A;2023-10-10
3. Tin removal by an annular surface wave plasma antenna in an extreme ultraviolet lithography source;Journal of Applied Physics;2022-09-21
4. Application of a dual-thermopile radical probe to expanding hydrogen plasmas;Plasma Sources Science and Technology;2022-08-01
5. Feasibility study on reactive ion etching occurrence in EUV-induced photoionized hydrogen plasmas based on electron temperature and electron density measurements;Japanese Journal of Applied Physics;2022-04-22
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