Magnetic Field Resonance and Pressure Effects on Epitaxial Thin Film Deposition and In Situ Plasma Diagnostics
Author:
Publisher
Springer Science and Business Media LLC
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry
Link
http://link.springer.com/article/10.1007/s11090-017-9853-3/fulltext.html
Reference18 articles.
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3. DeBoer SJ, Dalal VL, Chumanov G, Bartels R (1995) Low temperature epitaxial silicon film growth using high vacuum electron cyclotron resonance plasma deposition. Appl Phys Lett 66:19–21
4. Thang DH, Muta H, Kawai Y (2008) Investigation of plasma parameters in 915 MHz ECR plasma with SiH4/H2 mixtures. Thin Solid Films 516:4452–4455
5. Kawai Y, Itagaki N, Koga M, Muta H (2005) Production of low electron temperature ECR plasma. Surf Coat Technol 193:11–16
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