Controlled size and density distribution of nanoparticles by thermal ammonia etching method
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science
Link
http://link.springer.com/content/pdf/10.1007/s11595-010-1108-6.pdf
Reference17 articles.
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2. Y C Choi, Y M Shin, Y H Lee, et al. Controlling the Diameter, Growth Rate,and Density of Vertically Aligned Carbon Nanotubes Synthesized by Microwave Plasma-enhanced Chemical Vapor Deposition[J]. Appl. Phys. Lett., 2000, 76: 2 367–2 369
3. Y C Choi, Y M Shin, S C Lim, et al. Effect of Surface Morphology of Ni Thin Film on the Growth of Aligned Carbon Nanotubes by Microwave Plasma-enhanced Chemical Vapor Deposition[J]. J. Appl. Phys., 2000, 88: 4 898–4 903
4. G Li, M Zhou, W W Ma, et al. Synthesis of Aligned Carbon Nanotubes by Thermal Chemical Vapor Deposition[J]. J. of Wuhan University of Technology-Mater. Sci.Ed., 2009, 24(1): 15–19
5. YC Choi, D W Kim, T J Lee, et al. Growth Mechanism of Vertically Aligned Carbon Nanotubes on Silicon Substrates[J]. Synth. Metals, 2001, 117: 81–86
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