DFB LD manufactured by nanoimprint lithography
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://link.springer.com/content/pdf/10.1007/s12200-010-0005-0.pdf
Reference11 articles.
1. Kaden C, Griesinger U, Schweitzer H, Pilkuhn M H, Stath N. Fabrication of nonconventional distributed feedback lasers with variable grating periods and phase shifts by electron beam lithography. Journal of Vacuum Science and Technology B, 1992, 10(6): 2970–2973
2. Chou S Y, Krauss P R, Renstrom P J. Imprint of sub-25 nm vias and trenches in polymers. Applied Physics Letters, 1995, 67(21): 3114–3116
3. Chou S Y, Krauss P R, Zhang W, Guo L, Zhuang L. Sub-10 nm imprint lithography and applications. Journal of Vacuum Science and Technology B, 1997, 15(6): 2897–2904
4. Scheer H C, Schulz H. A contribution to the flow behaviour of thin polymer films during hot embossing lithography. Microelectronic Engineering, 2001, 56(3,4): 311–332
5. Chen Y, Roy E, Kanamori Y, Belotti M, Decanini D. Soft nanoimprint lithography. Proceedings of SPIE, 2005, 5645: 283–288
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