Pulsed Nd:YAG laser treatment of monocrystalline silicon substrate-Reference-Cited by-同舟云学术

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Pulsed Nd:YAG laser treatment of monocrystalline silicon substrate

Published:2011-02-03 Issue:1-4 Volume:56 Page:223-231
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Hsiao Wen-Tse,Tseng Shih-Feng,Huang Kuo-Cheng,Wang Yan-Hsin,Chen Ming-Fei

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

http://link.springer.com/content/pdf/10.1007/s00170-011-3170-4.pdf

Reference24 articles.

1. Green MA (2000) Photovoltaics: technology overview. Energy Policy 28:989–998

2. Dobrzański LA, Drygała A (2007) Laser processing of multicrystalline silicon for texturization of solar cells. J Mater Process Technol 191:228–231

3. Green MA, Zhao J (1990) 24% efficient silicon solar cell. Appl Phys Lett 57:602–604

4. Zhao J, Altermatt WP, Green MA (1995) Twenty-four percent efficient silicon solar cells with double layer antireflection coatings and reduced resistance loss. Appl Phys Lett 66:3636–3638

5. Rohatgi A, Narasimha S, Ebong AU, Doshi P (1999) Understanding and implementation of rapid thermal technologies for high-efficiency silicon solar cells. IEEE Trans Electron Devices 46:1970–1977

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