Influence of developer temperature on the shape of structures fabricated by deep X-ray lithography

Author:

Horade Mitsuhiro,Sugiyama Susumu

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Chou HY, Chang SB, Lin F, Yang CR, Lou R, Kuo WK, Chen CJ, Huang WH (1998) Rapid 3D microstructure fabrication by using excimer laser micromachining with image processing technologies. In: ASPE Annual Proceedings, Indianapolis, pp 189–192

2. Feiertag G, Ehrfeld W, Lehr H, Schmidt A, Schmidt M (1997) Accuracy of structure transfer in deep X-ray lithography. Microelectron Eng 35:557–560

3. Fujinawa S, Kato F and Sugiyama S (2006) Development of fabrication process for shape-control of three-dimensional submicron structure by synchrotron radiation lithography. In: Proceedings of the SPIE—the International Society for Optical Engineering, vol. 6037, pp 331–338. doi: 10.1117/12.638569

4. Horade M, Sugiyama S (2010) Study on fabrication of 3-D microstructures by synchrotron radiation based on pixels exposed lithography. Microsyst Technol 16(9):1331–1338. doi: 10.1007/s00542-010-1036-6

5. Jiang MS, Chuang TH, Fu CC, Shew BY, Lei WT (2007) Swelling phenomena of PMMA with X-ray lithography. In: Proceedings of the 2nd Asia-Oceania Forum for Synchrotron Radiation Research, Hsin-chu

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