Restraint of stress in fabricating the large areas of crack-free porous silica films in the presence of composite polydimethylsiloxane-Reference-Cited by-同舟云学术

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Restraint of stress in fabricating the large areas of crack-free porous silica films in the presence of composite polydimethylsiloxane

Published:2013-11-12 Issue:1 Volume:69 Page:193-198
ISSN:0928-0707
Container-title:Journal of Sol-Gel Science and Technology
language:en
Short-container-title:J Sol-Gel Sci Technol

Author:

Quan Hongyu,Zhao Baixiong,Liao Xinhua,Mei Qiang

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Condensed Matter Physics,Biomaterials,General Chemistry,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s10971-013-3203-6.pdf

Reference23 articles.

1. Akai D, Yokawa M, Hirabayashi K, Matsushita K, Sawada K, Ishida M (2005) Appl Phys Lett 86:202906

2. Scott JF (2007) Science 315:954–959

3. Jiang CY, McConney ME, Singamaneni S, Merrick E, Chen YC, Zhao J, Zhang L, Tsukruk VV (2006) Chem Mater 18:2632–2634

4. Cao ZQ, Zhang TY, Zhang X (2005) J Appl Phys 97:104909

5. Chung KJ, Peckerar M, Bernstein JB (2013) Microelectron Eng 103:70–75

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