Pattern transfer and photoluminescence damage assessment of deep-submicrometer features etched by photon-induced cryoetching-Reference-Cited by-同舟云学术

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Pattern transfer and photoluminescence damage assessment of deep-submicrometer features etched by photon-induced cryoetching

Published:1996-08 Issue:2 Volume:63 Page:143-151
ISSN:0947-8396
Container-title:Applied Physics A Materials Science & Processing
language:en
Short-container-title:Appl. Phys. A

Author:

Freiler M. B.,Shih M. C.,Kim S.,Levy M.,Herman I. P.,Scarmozzino R.,Osgood R. M.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01567642.pdf

Reference42 articles.

1. T. Arikayo, M. Sekine, H. Okano, Y. Horiike: Mater Res. Soc. Symp. Proc.29, 167 (1984)

2. P.D Brewer, S. Halle, R.M. Osgood, Jr.: Appl. Phys. Lett.45,475 (1984)

3. A. Aliouchouche, J. Boulmer, B. Bourguignon, J.-P. Budin, D. Debarre, A. Desmur: Appl. Surf. Sci.69, 52 (1993)

4. R. Heydel, R. Matz, W. Göpel: Appl. Surf. Sci.69, 38 (1993)

5. F. Foulon, M. Green: Appl. Phys. A60, 377 (1995)

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2. Surface topology using laser backscattering and photoluminescence on Cu- and In-rich CuInSe2thin films;Measurement Science and Technology;2006-11-07

3. Electron cyclotron resonance plasma etching of GaSb-based alloys;Applied Physics Letters;2000

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