Study on the development of CeO2 self-sharpening gel abrasive tools and grinding performance on quartz glass
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Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s12206-024-0831-4.pdf
Reference33 articles.
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4. X. Zhang, P. Yao, Y. Li, L. Jiang, X. Jin, J. Xu, S. Liang, J. Zhu, C. Huang, H. Zhu and H. Liu, Mechanism analysis and modeling of surface roughness for CeO2 slurry-enhanced grinding BK7 optics, International Journal of Advanced Manufacturing Technology, 131 (2022) 2017–2038.
5. K. Bae, K. H. Baek, J. Kim, H. Kim, B. U. Yoon and J. J. Kim, Highly selective chemical mechanical polishing of Si3N4over SiO2 using advanced silica abrasive, Japanese Journal of Applied Physics, 56(5) (2017) 056501.
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