Optimal Scaling Methodologies and Transistor Performance-Reference-Cited by-同舟云学术

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Optimal Scaling Methodologies and Transistor Performance

Published:2005 Issue: Volume: Page:143-194
ISSN:1437-0387
Container-title:High Dielectric Constant Materials
language:
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Author:

Skotnicki T.,Boeuf F.

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/3-540-26462-0_6

Reference57 articles.

1. R.H. Denard et al., IEEE J. SSC, pp. 256–268, Sept. 1974

2. ITRS (International Technology Roadmap for Semiconductors), 1999 Edition

3. ITRS (International Technology Roadmap for Semiconductors), 2001 Edition

4. T. Skotnicki et al., A New Analog/Digital CAD model for Sub-Halfmicron MOSFETs, 1994 IEDM Tech. Digest, pp. 165–168

5. T. Skotnicki, Rep. French Acad. of Science Tom 1, Series IV, pp. 885–909, Paris 2000

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Materials and device structures for sub-32 nm CMOS nodes;Microelectronic Engineering;2007-09

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