Model Simulations of the Boundary-Layer Evolution over an Arid Andes Valley
Author:
Publisher
Springer Science and Business Media LLC
Subject
Atmospheric Science
Link
http://link.springer.com/content/pdf/10.1007/s10546-008-9293-y.pdf
Reference48 articles.
1. Adrian G, Fiedler F (1991) Simulation of unstationary wind- and temperature fields over complex terrain and comparison with observations. Contr Phys Atmos 64: 27–48
2. Barry RG (1992) Mountain weather and climate. Routledge, London, p 402 pp
3. Bischoff-Gauß I, Kalthoff N, Fiebig-Wittmaack M (2006) The influence of a storage lake in the arid Elqui valley in Chile on local climate. Theor Appl Climatol 85: 227–241
4. Businger JA, Wyngaard JC, Izumi Y, Bradley EF (1971) Flux profile relationships in the atmospheric boundary-layer. J Atmos Sci 28: 181–189
5. Deardorff JW (1972) Parameterization of the planetary boundary layer for use in general circulation models. Mon Wea Rev 100: 93–106
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Changes in meteorological parameters during the total solar eclipse of 2 July 2019 in La Serena, Chile;Annals of Geophysics;2022-09-29
2. Using Commercial Aircraft Meteorological Data to Assess the Heat Budget of the Convective Boundary Layer Over the Santiago Valley in Central Chile;Boundary-Layer Meteorology;2022-01-07
3. Spatio-temporal Structure of the Boundary Layer under the Impact of Mountain Waves;Meteorologische Zeitschrift;2020-11-12
4. Variability and forecasting of air temperature in Elqui Valley (Chile);Earth Science Informatics;2020-09-22
5. Characteristics and evolution of diurnal foehn events in the Dead Sea valley;Atmospheric Chemistry and Physics;2018-12-21
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3