Organic contaminants removal by N2O plasma treatment-Reference-Cited by-同舟云学术

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Organic contaminants removal by N2O plasma treatment

Published:2005-08 Issue:15 Volume:40 Page:4137-4139
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Kim Dae Kyu,Park Yun Kyu,Lee Chongmu

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/s10853-005-2565-8.pdf

Reference16 articles.

1. K. SAGA and T. HATTORI, Appl. Phys. Lett. 71 (1997) 3670.

2. T. OGATA et al., Jpn. J. Appl. Phys. Part 1 37 (1998) 2468.

3. T. YOSHIDA, D. IMAFUKU, S. MIYAZAKI and M. HIROSE, in Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS ‘96, Acco, Leuven, Belgium, 1996, p. 305.

4. F. TARDIF, G. QUAGLIOTTI, T. BAFFERT and L. SECOURGEON, in Proceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces, UCPSS ‘96, Acco, Leuven, Belgium, 1996, p. 309.

5. T. OHMI, J. Vac. Sci. Technol. A 13 (1995) 1665.

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effects of N2O plasma treatment on perhydropolysilazane spin-on-dielectrics for inter-layer-dielectric applications;Thin Solid Films;2014-01

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