Influence of the C+-Implantation Dose on the Wetting and Adhesion Properties of Silicon Surfaces

Author:

Wang D. G.,Zhang D. K.

Publisher

Springer Berlin Heidelberg

Reference22 articles.

1. Ma, H.C., Ding, J.N, 2005, “Research on surface effect and size effect of stiction in MEMS,” Master Degree Thesis of Jiangsu Uinversity, Abstract.(In Chinese)

2. Li, X., Tang, Z.A., 2005, “Studies on DLC film’s preparation, microtribology and application for restraining the stiction in MEMS,” Doctoral dissertation of Dalian University of Technology, Chapter five, pp.40–84. (In Chinese)

3. Miyamoto, T., Miyake, S., Kaneko R., 1993, “Wear resistance of C+-implanted silicon investigated by scanning probe microscopy,” Wear, 162–164, pp.733–738.

4. Zhang, D.K., Ge, S.R., 2007, “Influence of the C+-implantation on the micro-tribological behavior of silicon wafer,” Chinese Journal of Materials Reasearch, 21(4), pp. 383–388. (In Chinese)

5. Sun, R., Xu, T., Zhang, J.W., Xue, Q.J., 2006, “The study of ion amorphous carbon films on single crystal silicon by C ion implantation,” Applied Surface Science, pp.4236–4243.

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