1. Bean K. E., (1978), Anisotropic etching of silicon, IEEE Trans.Electron Devices, ED-25: 1185–1193
2. Robbins H. R. and B. Schwartz, (1976), Chemical etching of silicon—IV. Etching technology, J. Electrochem. Soc., 123(12): 1903–1909
3. Bassous E., (1978), Fabrication of novel three-dimensional micro-structures by the anisotropic etching of (100) and (110) silicon, IEEE Trans. Electron Devices, ED-25: 178–1185
4. Li Xinxin, Minhang Bao and Shaoqun Shen, (1996), Maskless etching of three-dimensional silicon structures in KOH, Sensors and Actuators A, 571996): 47–52
5. Li Xinxin, Minhang Bao, (2001), Micro-machining of multi-thickness sensor array structures with dual-stage etching etching Technology, Journal of Micromechanics and Microengineering, 11(2001): 239–244