Using HF rather than NH4F as doping source for spray-deposited SnO2:F thin films
Author:
Publisher
Springer Science and Business Media LLC
Subject
Metals and Alloys,General Engineering
Link
http://link.springer.com/content/pdf/10.1007/s11771-012-1073-7.pdf
Reference21 articles.
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3. BANERJEE A. MAITY N R. KUNDOO S, CHATTOPADHYAY K. K. Poole-Frenkel effect in nanocrystalline SnO2:F thin films prepared by a sol-gel dip-coating technique [J]. Phys Stat Sol A, 2004, 201(5): 983–989.
4. SHANTHI E, BANERJEE A, DUTTA V, CHOPRA L K. Electrical and optical properties of tin oxide films doped with F and (Sb + F) [J]. J Appl Phys, 1982, 53(3): 1615–1621.
5. YADAV A A, MASUMDAR E U, MOHOLKAR A V, NEUMANN-SPALLART M, RAJPURE K Y, BHOSALE C H. Electrical, structural and optical properties of SnO2:F thin films: Effect of the substrate temperature [J]. Journal of Alloys and Compounds, 2009, 488: 350–355.
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