Evaluation of CF4 plasma chemistry by power modulation-Reference-Cited by-同舟云学术

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Evaluation of CF4 plasma chemistry by power modulation

Published:1992-12 Issue:4 Volume:12 Page:523-549
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Kiss L. D. B.,Sawin H. H.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01447257.pdf

Reference56 articles.

1. I. C. Plumb and K. R. Ryan,Plasma Chem. Plasma Process.6, 205 (1986).

2. G. Smolinsky and D. L. Flamm,J. Appl. Phys. 50, 4982 (1979).

3. R. d'Agostino, F. Cramarossa, S. De Benedictis, and G. Ferraro,J. Appl. Phys. 52, 1259 (1981).

4. P. J. Hargis, Jr., and M. J. Kushner,Appl. Phys. Lett. 40, 779 (1982).

5. S. G. Hansen, G. Luckmann, and S. D. Colson,Appl. Phys. Lett. 53, 1588 (1988).

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