Galvanostatic electrodeposition and microstructure of copper (I) oxide film
Author:
Affiliation:
1. Institute of Metal Research, Chinese Academy of Science, 72 Wenhua Road, Shenyang 110015, P.R. China Fax: ,
2. Department of Chemistry and Graduate Center for Material Research, University of Missouri-Rolla, Rolla, MO 65401, USA
Publisher
Informa UK Limited
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
https://www.tandfonline.com/doi/pdf/10.1007/s100190050056
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1. Electrodeposited Defect Chemistry Superlattices
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5. Photovoltaic effect in cuprous oxide-copper junctions in relation to the optical absorption spectrum of cuprous oxide
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