RF Power Effect on the Properties of Sputtered ZnO Films for Channel Layer Applications in Thin-Film Transistors-Reference-Cited by-同舟云学术

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RF Power Effect on the Properties of Sputtered ZnO Films for Channel Layer Applications in Thin-Film Transistors

Published:2012-03-17 Issue:7 Volume:41 Page:1962-1969
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Medina-Montes M.I.,Arizpe-Chávez H.,Baldenegro-Pérez L.A.,Quevedo-López M.A.,Ramírez-Bon R.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11664-012-1994-9.pdf

Reference25 articles.

1. K. Ellmer, A. Klein, and B. Rech, Transparent Conductive Zinc Oxide: Basics and Applications in Thin Film Solar Cells (New York: Springer, 2008).

2. Q.P. Wang, D.H. Zhang, H.L. Ma, X.H. Zhang, and X.J. Zhang, Appl. Surf. Sci. 220, 12 (2003).

3. Y. Liu, Y. Yua, X. Gao, S. Yan, X. Cao, and G. Wei, Mater. Lett. 61, 4463 (2007).

4. R. Das, K. Adhikary, and S. Ray, Jpn. J. Appl. Phys. 47, 1501 (2008).

5. P.F. Carcia, R.S. McLean, M.H. Reilly, and G. Nunes Jr, Appl. Phys. Lett. 82, 1117 (2003).

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