1. U.K. Mishra, L. Shen, T.E. Kazior, and Y.-F. Wu, Proc. IEEE 96, 287 (2008).
2. A.C. Schmitz, A.T. Ping, M. Asif Khan, Q. Chen, J.W. Yang, and I. Adesida, J. Electron. Mater. 27, 255 (1998).
3. G.H. Jessen, R.C. Fitch, J.K. Gillespie, G.D. Via, N.A. Moser, M.J. Yannuzzi, A. Crespo, R.W. Dettmer, and T.J. Jenkins, Proc. IEEE GaAs Symp., Nov. 2003, pp. 277–279.
4. Y. Yamashita, A. Endoh, K. Ikeda, K. HikosakaL, T. Mimura, M. HigashiwakiL, T. Matsui, and S. Hiyamizu, J. Vac. Sci. Technol. B, Microel. Process. Phenom. 23, L13 (2005).
5. J.-P. Ao, D. Kikuta, N. Kubota, Y. Naoi, and Y. Ohno, IEEE Electron. Dev. Lett. 24, 500 (2003).