Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Reference141 articles.
1. Kanarik, K.J., Lill, T., Hudson, E.A., Sriraman, S., Tan, S., Marks, J., Vahedi, V., Gottscho, R.A.: Overview of atomic layer etching in the semiconductor industry. J. Vacuum Sci. Technol. A Vacuum Surf. Films 33, 020802 (2015)
2. Kanarik, K.J., Tan, S., Holland, J., Eppler, A., Vahedi, V., Marks, J., Gottscho, R.A.: Moving atomic layer etch from lab to tab. Solid State Technol. 56, 14–17 (2013)
3. Kim, Y., Lim, W., Park, J., Yeom, G.: Layer by layer etching of the highly oriented pyrolythic graphite by using atomic layer etching. J. Electrochem. Soc. 158, D710 (2011)
4. Oehrlein, G., Metzler, D., Li, C.: Atomic layer etching at the tipping point: an overview. ECS J. Solid State Sci. Technol. 4, N5041 (2015)
5. Carver, C.T., Plombon, J.J., Romero, P.E., Suri, S., Tronic, T.A., Turkot, R.B., Jr.: Atomic layer etching: An industry perspective. ECS J. Solid State Sci. Technol. 4, N5005 (2015)
Cited by
4 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献