Author:
Limanov A. B.,Borisov V. M.,Vinokhodov A. Yu.,Demin A. I.,El’tsov A. I.,Kirukhin Yu. B.,Khristoforov O. B.
Reference6 articles.
1. Sposili R.S. and Im J.S. (1996) Sequential lateral solidification of thin silicon films on SiO2, Appl. Phys. Lett. 69, 2864–2866.
2. Im J.S., Sposili R.S., and Crowder M.A. (1997) Single-crystal Si films for thin-film transistor devices, Appl. Phys. Lett. 70, 3434–3436.
3. Secco d’Aragona. (1972) Dislocation etch for (100) planes in silicon. J.Electrochem. Soc., 119, 948–951.
4. Limanov A.B., Chubarenko V.A., Borisov V.M., Vinokhodov A.Yu., Demin A.I., Khristoforov O.B., El’tsov A.V., Kirukhin Yu.B. (1999) Investigation in Si films obtained by SLS technique using of 3 kHz excimer laser with stripped output beam. Russian Microelectronics
28, 00–00.
5. Im J.S., Kim H.J., Thompson M.O. (1993) Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films. Appl. Phys. Lett. 63, 1969–1971.
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