Nanoimprinting
Author:
Chen Wei,Wang Chunlei
Publisher
Springer Netherlands
Reference22 articles.
1. Ofir, Y., Moran, I.W., Subramani, C., Carter, K.R., Rotello, V.M.: Nanoimprint lithography for functional three-dimensional patterns. Adv. Mater. 22, 3608–3614 (2008) 2. Glinsner, T., Kreindl, G., Kast, M.: Nanoimprint lithography. Optik & Photonik 2, 42–45 (2010) 3. Guo, L.J.: Nanoimprint lithography: methods and materials requirements. Adv. Mater. 19, 495–513 (2007) 4. Schift, H.: Nanoimprint lithography: an old story in modern times? A review. J Val. Sci. Technol. B 26, 458–480 (2008) 5. Chou, S.Y., Krauss, P.R., Renstrom, P.J.: Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett. 67, 3114–3116 (1995)
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