Electrical Activity of Iron and Copper in Si, SiGe and Ge
Author:
Publisher
Springer International Publishing
Link
http://link.springer.com/content/pdf/10.1007/978-3-319-93925-4_5
Reference275 articles.
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3. C. Claeys, E. Simoen (eds.), Germanium-Based Technologies—From Materials to Devices (Elsevier, 2007)
4. A.A. Istratov, H. Hieslmair, E.R. Weber, Iron and its complexes in silicon. Appl. Phys. A 69, 13–44 (1999). https://doi.org/10.1007/s003399900059
5. A.A. Istratov, H. Hieslmair, E.R. Weber, Iron contamination in silicon technology. Appl. Phys. A 70, 489–534 (2000). https://doi.org/10.1007/s003390000458
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