Introduction
Author:
Publisher
Springer International Publishing
Link
http://link.springer.com/content/pdf/10.1007/978-3-319-20385-0_1
Reference22 articles.
1. Pan, D.Z., Yu, B., Gao, J.-R.: Design for manufacturing with emerging nanolithography. IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 32(10), 1453–1472 (2013)
2. Yu, B., Gao, J.-R., Ding, D., Ban, Y., Yang, J.-S., Yuan, K., Cho, M., Pan, D.Z.: Dealing with IC manufacturability in extreme scaling. In: IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242 (2012)
3. Mack, C.: Fundamental Principles of Optical Lithography: The Science of Microfabrication. Wiley, Chichester (2008)
4. Wong, A.K.-K.: Resolution Enhancement Techniques in Optical Lithography, vol. 47. SPIE Press (2001). DOI: 10.1117/3.401208
5. Lin, B.J.: Successors of ArF water-immersion lithography: EUV lithography, multi-e-beam maskless lithography, or nanoimprint? J. Micro/Nanolithog. MEMS MOEMS 7(4), 040101 (2008)
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