Plasma-Assisted Deposition and Crystal Growth of Thin Indium-Tin-Oxide (ITO) Films
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Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-540-39970-4_23.pdf
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Self-buckled effect of cubic Cu3N film: Surface stoichiometry;AIP Conference Proceedings;2018
2. Pressure dependence of Ar${\hspace{0pt}}_2^+$ , ArTi+, and Ti${\hspace{0pt}}_2^+$ dimer formation in a magnetron sputtering discharge;Journal of Physics D: Applied Physics;2017-10-12
3. Strain Effects by Surface Oxidation of Cu3N Thin Films Deposited by DC Magnetron Sputtering;Coatings;2017-04-29
4. Correlations of plasma parameters and properties of magnetron sputtered TiN films;The European Physical Journal Applied Physics;2012-08
5. Time-Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 µs and 500 µs;Contributions to Plasma Physics;2011-03
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