Transient interferometric technique for measuring thermal expansion at high temperatures: Thermal expansion of tantalum in the range 1500?3200 K-Reference-Cited by-同舟云学术

Transient interferometric technique for measuring thermal expansion at high temperatures: Thermal expansion of tantalum in the range 1500?3200 K

Published:1982-09 Issue:3 Volume:3 Page:259-288
ISSN:0195-928X
Container-title:International Journal of Thermophysics
language:en
Short-container-title:Int J Thermophys

Author:

Miiller A. P.,Cezairliyan A.

Publisher

Springer Science and Business Media LLC

Subject

Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/BF00503321.pdf

Reference23 articles.

1. A. Cezairliyan, High Temp.-High Press. 11:9 (1979).

2. R. A. Finch and R. E. Taylor, Rev. Sci. Instrum. 40:1195 (1969).

3. G. R. Gathers, J. W. Shaner, and R. L. Brier, Rev. Sci. Instrum. 47:471 (1976).

4. A. Cezairliyan, Rev. Sci. Instrum. 42:540 (1971).

5. G. Ruffino, A. Rosso, L. Coslovi, and F. Righini, in AIP Conference Proceedings No. 17 ?Thermal Expansion, R. E. Taylor and G. L. Denman, eds. (American Institute of Physics, New York, 1974), p. 159.

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