20 nm GAA-GaN/Al2O3 nanowire MOSFET for improved analog/linearity performance metrics and suppressed distortion
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Link
https://link.springer.com/content/pdf/10.1007/s00339-021-04673-9.pdf
Reference35 articles.
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3. A. Kumar, M. Tripathi, R. Chaujar, Reliability issues of In 2 O 5 Sn gate electrode recessed channel MOSFET: impact of interface trap charges and temperature. IEEE Trans. Electron Devices 65(3), 860–866 (2018)
4. P. Fiorenza, F. Giannazzo, F. Roccaforte, Characterization of SiO2/4H-SiC interfaces in 4H-SiC MOSFETs: a review. Energies 12(12), 2310 (2019)
5. F. Lindelöw, N.S. Garigapati, L. Södergren, M. Borg, E. Lind, III–V nanowire MOSFETs with novel self-limiting Λ-ridge spacers for RF applications. Semicond. Sci. Technol. 35(6), 065015 (2020)
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