Publisher
Springer Science and Business Media LLC
Subject
General Engineering,General Materials Science
Reference64 articles.
1. H. Kim, J. Vac. Sci. Technol. B: Microelectron. Nanometer Struct. 21, 2231 (2003).
2. S.M. George, Chem. Rev. 110, 111 (2009).
3. M. Schumacher, P.K. Baumann, and T. Seidel, Chem. Vap. Depos. 12, 99 (2006).
4. J.F. Conley Jr., Y. Ono, and G.M. Stecker, Modulated Temperature Method of Atomic Layer Deposition (ALD) of High Dielectric Constant Films, Oct. 28, 2008. US Patent 7,442,415 (2008).
5. H. Chatham, Surf. Coat. Technol. 78, 1 (1996).
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