New Copolymers of Dialkyl Fumarates with Norbornene Derivatives for Sub-0.2 µm Lithography at a Wavelength of 193 nm: Synthesis and Thermal and Photochemical Transformations
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Published:2005-09
Issue:1-3
Volume:404
Page:159-161
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ISSN:0012-5016
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Container-title:Doklady Physical Chemistry
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language:en
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Short-container-title:Dokl Phys Chem
Author:
Vainer A. Ya.,Dyumaev K. M.,Eremina L. A.,Tamarkina R. V.,Ternovskii E. P.,Shvartsburg L. M.
Publisher
Springer Science and Business Media LLC
Subject
Physical and Theoretical Chemistry
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